HD Online Player (Gravity.3D.2013.1080p.BluRay.Half-SB) [PATCHED]

公開日:2022/07/18 / 最終更新日:2022/07/18

HD Online Player (Gravity.3D.2013.1080p.BluRay.Half-SB)

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HD Online Player (Gravity.3D.2013.1080p.BluRay.Half-SB) > DOWNLOAD.1. Field of the Invention The present invention relates to a method of dispersing a plurality of liquid carriers, and more particularly to a method of dispersing a plurality of liquid carriers to distribute at a required rate and to thereby form a plurality of microsized liquid carriers. 2. Description of the Prior Art For the purpose of making the object to be doped with a semiconductor liquid, the object to be doped is formed, using a mass-production type of equipment, into a semiconductor wafer-shaped substrate having a size of, for example, 300 mm in diameter, and the semiconductor wafer substrate having a doped object to be formed thereon is cut into a plurality of semiconductor chips each having a size of, for example, 50 mm.times.20 mm. In such a method of manufacturing semiconductor chips, a liquid dispersion, for example, of a solution of the semiconductor dopant, such as a solution of phosphorus or arsenic, is fed onto the semiconductor wafer substrate which has not yet been cut into chips. The composition, on the substrate, of the liquid dispersion varies due to the region and the amount of dopant to be supplied onto the semiconductor wafer substrate. With the foregoing in mind, the present applicant has proposed a method of doping a semiconductor wafer substrate, using a liquid dispersion formed from a plurality of liquid carriers mixed with a plurality of semiconductor dopants, as disclosed in the specification of European Patent Application No. 88-101,885 filed on Apr. 22, 1988. The proposed method and the invention thereof are explained in greater detail hereunder. In the conventional method of doping a semiconductor wafer substrate, a liquid dispersion comprising a plurality of liquid carriers, such as solutions, each having a different concentration of a semiconductor dopant, is fed onto a semiconductor wafer substrate in the form of a spray to thereby form on the substrate a plurality of microsized liquid dispersion regions having the different dopant concentration respectively. In the liquid dispersion regions, a state of uniformity and stability can be maintained during the period from formation of the liquid dispersion until application thereof to the semiconductor wafer substrate. At the same time, the shape of each of the liquid dispersion regions can be controlled. However, in a case where the liquid dispersion